
Permanents : Bernard GRUZZA, Luc BIDEUX, Christine ROBERT-GOUMET, Vladimir MATOLIN
PhD Students : Yamina OULD-METIDJI, Matthieu PETIT, David BACA



Bernard GRUZZA LAboratory of Material Sciences for Electronic and Automatic,France | UHV surface and interface studies by quantitative electron spectroscopies (ESCA, AES, EPES, EELS). Sources of atomic nitrogen, aluminium oxide and metal evaporation cells for in-situ elaboration of heterostructures. Electrical measurements : testing microelectronics devices and gas sensors. |
Maria LOSURDO Institute of Inorganic Methodologies and of Plasmas, Italy | Formation of ultrathin III-V n itrided layers by conventional MOCVD and by innovative plasma assisted methodologies. Development of non destructive optical and structural characterisations for surfaces and interfaces Development of innovative processes for III-V nitride structures. |
Thomas CHASSE Institute for Surface Modification, Germany | Thin nitride film preparation techniques: (i) Low-energy ion beam nitridation (ii) Low-energy ion beam assisted deposition Characterisation methods: - in-situ: LEED/AES, XPS, RHEED, ellipsometry, (synchrotron radiation based spectroscopy) - ex-situ : x-ray reflectometry, AFM. |
Vladimir MATOLIN Department of Electronics and Vacuum Physics, Czech Republic | Development of vacuum systems for thin film growth by means of molecular beam epitaxy under UHV and reactive plasma conditions. Investigation of surface and interface properties by XPS, XPD, RHEED, LEED, AES, SIMS, TDS and SRPES. Study of gas-surface interaction on sensors and catalysts. |
Jacek SZUBER Department of Microelectronics Silesian University of Technology, Poland | Contactless and non-destructive characterisation of surfaces and interfaces. Methods: Surface Photovoltage Spectroscopy, Photoluminescence, Cathodoluminescence combined with rigorous computer analysis. Development of advanced software for modelling and assessment of surface electronic parameters. |
Zineb BENAMARA Applied Micro Electronic Laboratory, Algeria | I(V) G(V) and C(V) measurements at different frequencies versus temperature. DLTS measurements. Four point probes resistivity measurements. Surface photoelectric voltage measurements under laser illumination. Transport phenomena modelling in optical and electronical devices. |
The partners:
Different programmes :
PICS :
Study of different stages of the III-V nitridation in ultravacuum, for opto and micro electronic devices elaboration -Surface analysis and electrical caracterisations (starting 2001)
Elaboration and caracterisation of III-V nitridated thin films for gas sensors elaboration (proposed 2002)
POLONIUM :
Caracterisation of thin films composites for sensor applications (2002-2004)
CMEP :
Utilisation des semi-conducteurs III-V dans les dispositifs electroniques, caracterisation et modelisation (1997-2002)
Others scientific cooperations with:
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